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  • Genesis-Series Spec
GENESIS-Series specification
Model Genesis-1000 Genesis-1100 Genesis-2020 Genesis-2120
Stage 5-axis Manual 
- X : 40mm (-20mm ~ 20mm)
- Y : 40mm (-20mm ~ 20mm)
- Z : 5 ~ 45mm
- T : -20° ~ 90°
- R : 360°
5-axis Motorized 
- X : 90mm (-45mm ~ 45mm)
- Y : 60mm (-30mm ~ 30mm)
- Z : 5 ~ 60mm
- T : -20° ~ 90°
- R:360°
Variable Pressure X O X O
Vacuum Mode High Vacuum only (<9×10-3Pa) High Vacuum Mode (<9×10-3Pa)
Low Vacuum Mode (10~230Pa)
High Vacuum only
(<9×10-3Pa)
High Vacuum Mode (<9×10-3Pa)
Low Vacuum Mode (10~230Pa)
Vacuum System Fully Automated Evacuation System
- Turbo molecular pump(Vacuum ready within 3 minutes)
- Rotary vane pump
- Electrical valve system
Electron Gun Pre-centered Tungsten Filament
Detector SE Detector (ET-type) SE Detector (ET-type) BSE Detector (4Chan-
nel, Semiconductor)
SE Detector (ET-type) SE Detector (ET-type) BSE Detector (4Chan-
nel, Semiconductor)
Resolution 3.0nm (SE Image) 3.0nm (SE Image)
5.0nm (BSE Image)
3.0nm (SE Image)
3.0nm (SE Image)
5.0nm (BSE Image)
Magnification x10 ~ x300,000
Acceleration Voltage 200V ~ 30kV
Objective IRIS 20 / 20 / 50 / 100μm (Variable aperture)
Image Shift 100μm
Maximum Sample Size Horizontal : 96mmVertical : 50mm Horizontal : 150mmVertical : 60mm
Advanced Scan Mode Dynamic FocusPoint & Line Scan, Tilt Compensation
Working Distance 0 ~ 45mm 0 ~ 60mm
Automatic Function Auto Brightness & ContrastAuto FocusAuto Gun AlignmentAuto Saturation
Auto FilamentBias
Image Format JPGTIFFBMPPNG
Display Mode Focus Mode : 320 × 240 pixel, Resizable
Preview Mode : 800 × 600
Slow Mode : Applicable to both preview and focus mode
Photo Mode : Up to 3200 × 2400
Dimension(mm) Installation Dimension : 1800 (W) x 600 (D)
- Main System : 600 (W) x 623 (D) x 1350 (H), 130Kg
- Rotary Pump : 454 (W) x 134 (D) x121 (H), 22Kg
Supplied Accessories Factory-centered Filament Cartridge 1box(10units)Specimen Mounts 1box(10units), Tweezer
Carbon TapeHex. Driver 0.89mm (1 ea.)Hex. T Wrench 2.5mm (2 ea.)
Operation Device(PC) Windows10 -based All-in-One 21.5” Workstation100% controlled by keyboard and mouse
Optional Devices EBSD(Electron Back Scattered Diffraction) EDS(Energy Dispersive Spectroscopy) WDS(Wavelength Dispersive Spectroscopy)CL(Cathodoluminescent) Image
Chamber CameraLaB6 / CeB6 Upgrade 3D Imaging Raman Spectroscopy
E-beam Lithography
Power Supply Single Phase : 100 ~ 240VAC, 50 / 60Hz, 1kVA